Matt Weimer
R&D Scientist
Forge Nano
Dr. Matt Weimer is an R&D Scientist at Forge Nano who specializes in object and semiconductor applications for atomic layer deposition (ALD). With a background in synthetic organometallic chemistry, experience in device characterization, and novel ALD tool development, he has hands-on experience with the full life cycle of ALD. Matt has a BS in Chemistry from the University of Washington and a PhD from the Illinois Institute of Technology with a joint graduate appointment at Argonne National Laboratory. After a postdoc at Argonne, he joined the R&D deposition group at Lam Research, where Matt spent time on new semiconductor product development. Utilizing his synthetic chemistry background, he developed multiple ALD and CVD solutions, on a variety tool sets, for a range of applications in both logic and memory. Matt has multiple papers, patents, and talks in the fields of synthetic chemistry, ALD and CVD. In his spare time, he is an avid racquetball player, hiker, and traveler and is on the board at the Denver Center for International Studies Foundation.
Presentations
Fast-ALD Solutions to Enable MicroLED Adoption
Conformal and pin-hole free thin-films are a critical part of LED device construction. Some CVD and PVD cannot scale with the dimensions of microLEDs. Fortunately, atomic layer deposition (ALD) can deposit dense, pin-hole free, conformal films in a non-line-of-sight fashion to coat extreme aspect ratio structures. ALD has been shown to provide superior low water vapor transmission rate ceramic films, at sub-10nm thickness, for microLED applications while providing low leakage current films. Forge Nano has a nanolaminate stack comprised of Al2O3 and SiO2, using our proprietary thermal ALD SiO2, with near-hermetic barrier protection and superior dielectric performance. While traditional ALD reactors are slow and inefficient, the ALDx toolset is faster, 10nm takes 85 and 90s respectively, and use 20-80x less precursor. Implementation of this unique thermal ALD SiO2 process in the ultra-fast and efficient ALDx toolset will enable progress in microLED development and adoption.